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Atomic Layer Deposition

Atomic Layer Deposition

In this activity, by the Concord Consortium's Molecular Literacy project, students "undertake a simulation of the Atomic Layer Deposition (ALD) technique, a CVD process in which two complementary precursors (e.g., Al(CH3)3 and H2O) are alternatively introduced into the reaction chamber, and build an atomic scale film." The activity itself is a java-based interactive resource built upon the free, open source Molecular Workbench software. In the activity, students are allowed to explore at their own pace in a digital environment which allows them to manipulate the variables in the simulation and create a report of the data captured. In addition to the activity, visitors will find an overview of the activity, a link to more information about how the process is used in manufacturing, and an explanation of the central concepts.

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