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"Making the Tiniest and Fastest Transistor using Atomic Layer Deposition (ALD)" icon

Making the Tiniest and Fastest Transistor using Atomic Layer Deposition (ALD)

Atomic layer deposition (ALD) is an emerging nanotechnology, which is a surface controlled self-limiting process and enables us to deposit ultrathin films one atomic layer by one atomic layer. ALD provides an unprecedented and powerful capability to grow or regrow nanoscale ultrathin films of metals, semiconductors and insulators. We will introduce the concept of ALD and the process how to the tiniest and fastest transistor using ALD.... Show More
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More about this material

Material Type:
Presentation
Date Added to MERLOT:
February 17, 2006
Date Modified in MERLOT:
June 12, 2018
Author:
Submitter:
nanoHUB
Primary Audience:
College General Ed
Technical Format:
Website, Flash
Mobile Compatibility:
Not specified at this time
Language:
English
Cost Involved:
No
Source Code Available:
No
Creative Commons:
No

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