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Fundamentals of Chemical Vapor Deposition

Fundamentals of Chemical Vapor Deposition

This web page offers a tutorial by Daniel M. Dobkin, Ph.D, proprietor of Enigmatics Consulting of Sunnyvale, California that introduces fundamental principles of chemical vapor deposition of films. Topics covered include CVD Basics, Review of Ideal Gases, Review of Kinetic Theory, Zero-Dimensional Transport: Stirred Reactor, Transport in Gaseous Media, Chemistry for CVD, Plasmas for CVD, CVD Films, and CVD Reactor Designs. According to the author, "The tutorial assumes a general background roughly equivalent to a BS degree in the physical sciences. The aspects of thermodynamics, statistical mechanics, chemistry, and electromagnetism needed for understanding CVD processes are reviewed here, but only in sufficient depth to remind the reader of a past acquaintance with the topics…. Some knowledge of the basics of semiconductor manufacturing is also helpful in following the discussion of films and applications." Visitors are free to copy and use any materials in the site, so long as licensing conditions stipulated by Creative Commons are met. (Details of the license can be found by clicking on a hyperlink to Creative Commons.)


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